Clochard, Laurent, David Young, Mingzhe Yu, and Ruy Sebastian Bonilla. “Patterning by Selective Etching of Poly-Silicon Using a High Etch Rate Single Sided Gaseous Process”. SiliconPV Conference Proceedings 2 (December 6, 2024). Accessed December 19, 2024. https://www.tib-op.org/ojs/index.php/siliconpv/article/view/1317.