CLOCHARD, Laurent; YOUNG, David; YU, Mingzhe; BONILLA, Ruy Sebastian. Patterning by Selective Etching of Poly-Silicon Using a High Etch Rate Single Sided Gaseous Process. SiliconPV Conference Proceedings, [S. l.], v. 2, 2024. DOI: 10.52825/siliconpv.v2i.1317. Disponível em: https://www.tib-op.org/ojs/index.php/siliconpv/article/view/1317. Acesso em: 19 dec. 2024.