GAPP, Benjamin; PLAGWITZ, Heiko; HAHN, Giso; TERHEIDEN, Barbara. RF-Sputtered Ti-Based Dielectric Layers as Al-Diffusion Barrier for Passivating Contacts. SiliconPV Conference Proceedings, [S. l.], v. 2, 2024. DOI: 10.52825/siliconpv.v2i.1303. Disponível em: https://www.tib-op.org/ojs/index.php/siliconpv/article/view/1303. Acesso em: 19 dec. 2024.